15/01/2020

PhD in Chemistry: Surface Engineered Nanocrystals: EPR Radical Detection of Photoactivity

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  • NAME DER EINRICHTUNG
    Cardiff University
  • ZIELLAND
    United Kingdom
  • BEWERBUNGSFRIST
    30/04/2020
  • FORSCHUNGSBEREICH
    Formal sciences
    Natural sciences

Outline

This PhD project aims to provide atomic level information of reactive centres in photocatalytic materials through the application of advanced Electron Paramagnetic Resonance (EPR) spectroscopy, to yield detailed reaction mechanisms and kinetics. The project will involve synthesis of nanoparticles, in collaboration with colleagues in Hokkaido University (Japan), and advanced characterisation via multiple spectroscopic techniques (SEM, UV-vis, XPS, EPR).

What is funded

This is a 3.5 year funded PhD with Home/EU tuition fees and a standard stipend.

This studentship is open to Home, EU or Overseas Candidates.

However, Overseas candidates should note that they will be required to cover the difference between Home and Overseas tuition fees each year.

Eligibility

Candidates should hold or expect to gain a first class degree or a good 2.1 and/or an appropriate Master’s level qualification (or their equivalent).

How to Apply

Applicants should apply to the Doctor of Philosophy in Chemistry with a start date of July 2020.

In the research proposal section of your application, please specify the project title and supervisors of this project and copy the project description in the text box provided. In the funding section, please select ’I will be applying for a scholarship/grant’ and specify that you are applying for advertised funding from PhD in Chemistry: Surface Engineered Nanocrystals: EPR Radical Detection of Photoactivity

Deadline: 31st April 2020. We will review applications on an ongoing basis so early application is advised.

We reserve the right to close this advert if sufficient applications are received.

Disclaimer:

The responsibility for the funding offers published on this website, including the funding description, lies entirely with the publishing institutions. The application is handled uniquely by the employer, who is also fully responsible for the recruitment and selection processes.